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dc.rights.licenseIn Copyrighten_US
dc.contributor.advisor
dc.creatorSeredinski, Andrew Michael
dc.date.accessioned2014-04-28T12:02:06Z
dc.date.available2014-04-28T12:02:06Z
dc.date.created2014
dc.date.issued2014
dc.identifier.urihttp://hdl.handle.net/11021/27335
dc.descriptionThesis; [FULL-TEXT RESTRICTED TO WASHINGTON AND LEE UNIVERSITY LOGIN]en_US
dc.descriptionAndrew Michael Seredinski is a member of the Class of 2014 of Washington and Lee University.en_US
dc.description.abstractI review several cooperative sequential adsorption (CSA) approaches with and without evaporation to modeling particle deposition in ionic self-assembled monolayers (ISAM). I then build on the mean field method by introducing time-varying deposition rates that provide greater flexibility in convergence behavior to the steady state of the system. I compare this both with preliminary experimental data, and the mean field method with constant deposition rates.en_US
dc.description.statementofresponsibilityA. M. Seredinski
dc.format.extent21 pagesen_US
dc.language.isoen_USen_US
dc.rightsThis material is made available for use in research, teaching, and private study, pursuant to U.S. Copyright law. The user assumes full responsibility for any use of the materials, including but not limited to, infringement of copyright and publication rights of reproduced materials. Any materials used should be fully credited with the source.en_US
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en_US
dc.subject.otherWashington and Lee University -- Honors in Physics and Engineeringen_US
dc.titleModeling Self-Assembly of Nanoparticles: Cooperative Sequential Adsorption with Evaporation and Time-Varying Rates (thesis)en_US
dc.typeTexten_US
dc.rights.holderSeredinski, Andrew Michael
dc.subject.fastNanoparticlesen_US
dc.subject.fastAdsorptionen_US
dc.subject.fastParticles (Nuclear physics)en_US
dc.subject.fastCoating processesen_US
dc.subject.fastSelf-assembly (Chemistry)en_US
dc.subject.fastThin films, Multilayereden_US


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