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dc.rights.licenseIn Copyrighten_US
dc.creatorBurks, Edward Calohill, III
dc.date.accessioned2023-04-21T19:30:35Z
dc.date.available2023-04-21T19:30:35Z
dc.date.created2010
dc.identifierWLURG038_Burks_thesis_2010
dc.identifier.urihttps://dspace.wlu.edu/handle/11021/36195
dc.descriptionSome of the images in the original are very poor quality.en_US
dc.description.abstractThis study examines several factors that affect the quality of antireflective coatings created by the self-assembly of alternating layers of silica (Si02) nanoparticles and poly(allylamine hydrochloride) or poly(diallyldimethylammonium chloride) (PAH and PDDA respectively) polycation on glass substrates. We employ a factorial experimental design to investigate the effects of the molarity of the nanoparticle solution, the size of the nanoparticles, the pH of the Si02 and polycation solutions, the number of silica-polycation bilayers, and the significance of an RCA cleaning process on the optical properties of the films. We examine the first order effects of these factors, as well as their interactions, on the reflectance, transmittance and uniformity of the coatings.en_US
dc.format.extent43 pagesen_US
dc.language.isoen_USen_US
dc.rightsThis material is made available for use in research, teaching, and private study, pursuant to U.S. Copyright law. The user assumes full responsibility for any use of the materials, including but not limited to, infringement of copyright and publication rights of reproduced materials. Any materials used should be fully credited with the source.en_US
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en_US
dc.subject.otherWashington and Lee University -- Honors in Physicsen_US
dc.titleThe Fabrication of Antireflective Coatings by the Self-assembly of Silica Nanopartical and Polycation Bilayers
dc.typeTexten_US
dcterms.isPartOfWLURG38 - Student Papers
dc.rights.holderBurks, Edward Calohill, III
dc.subject.fastThin films -- Surfacesen_US
dc.subject.fastReflection (Optics)en_US
dc.subject.fastAnti-reflective coatingsen_US
local.departmentPhysicsen_US
local.scholarshiptypeHonors Thesisen_US


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